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Design and reliability challenges in nanometer technologies
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Source Annual ACM IEEE Design Automation Conference archive
Proceedings of the 41st annual Design Automation Conference table of contents
San Diego, CA, USA
SESSION: Reliable system-on-a-chip design in the nanometer era table of contents
Pages: 75 - 75  
Year of Publication: 2004
ISBN:1-58113-828-8
Authors
Shekhar Borkar  Intel Labs, Hillsboro, OR
Tanay Karnik  Intel Labs, Hillsboro, OR
Vivek De  Intel Labs, Hillsboro, OR
Sponsors
ACM: Association for Computing Machinery
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
Bibliometrics
Downloads (6 Weeks): 21,   Downloads (12 Months): 138,   Citation Count: 21
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ABSTRACT

CMOS technology scaling is causing the channel lengths to be sub-wavelength of light. Parameter variation, caused by sub-wavelength lithography, will pose a major challenge for design and reliability of future high performance microprocessors in nanometer technologies. In this paper, we present the impact of these variations on processor functionality, predictability and reliability. We propose design and CAD solutions for variation tolerance. We conclude this paper with soft error rate scaling trends and soft error tolerant circuits for reliability enhancement.



CITED BY  21

Collaborative Colleagues:
Shekhar Borkar: colleagues
Tanay Karnik: colleagues
Vivek De: colleagues