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Modeling and estimation of total leakage current in nano-scaled CMOS devices considering the effect of parameter variation
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Source International Symposium on Low Power Electronics and Design archive
Proceedings of the 2003 international symposium on Low power electronics and design table of contents
Seoul, Korea
SESSION: Power estimation and design for scaled technologies table of contents
Pages: 172 - 175  
Year of Publication: 2003
ISBN:1-58113-682-X
Authors
Saibal Mukhopadhyay  Purdue University, West Lafayette, IN
Kaushik Roy  Purdue University, West Lafayette, IN
Sponsors
ACM: Association for Computing Machinery
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
Bibliometrics
Downloads (6 Weeks): 9,   Downloads (12 Months): 89,   Citation Count: 27
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ABSTRACT

In this paper we have developed analytical models to estimate the mean and the standard deviation in the gate, the subthreshold, the reverse biased source/drain junction band-to-band-tunneling (BTBT) and the total leakage in scaled CMOS devices considering variation in process parameters like device geometry, doping profile, flat-band voltage and supply voltage. We have verified the model using Monte Carlo simulation using an NMOS device of 50nm effective length and analyzed the results to enumerate the effect of different process parameters on the individual components and the total leakage.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
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K. Roy. et. al. "Leakage Current Mechanisms and Leakage Reduction Techniques in Deep-Submicron CMOS Circuits", Proceeding of IEEE, Feb, 2003.
 
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International Technology Roadmap for Semiconductors, 2001.
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BSIM: http://www-device.eecs.berkeley.edu/ bsim3/
 
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BPTM: http://www-device.eecs.berkeley.edu/ ptm/
 
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A. Papoulis, Probability, Ransom Variables and Stochastic Process," McGraw-Hill, Inc, 1991.
 
13
Z. Liu, et.al., "Threshold voltage model for deep-submicrometer MOSFET's", IEEE Trans. On Elec. Dev., Jan. 1993

CITED BY  27

Collaborative Colleagues:
Saibal Mukhopadhyay: colleagues
Kaushik Roy: colleagues