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A comment on “a fast parallel algorithm for thinning digital patterns”
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Communications of the ACM archive
Volume 29 ,  Issue 3  (March 1986) table of contents
The MIT Press scientific computation series
Pages: 239 - 242  
Year of Publication: 1986
ISSN:0001-0782
Authors
H. E. Lü  National Taiwan Univ., Taipei, Taiwan
P. S. P. Wang  Northeastern Univ., Boston, MA
Publisher
ACM  New York, NY, USA
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Downloads (6 Weeks): 17,   Downloads (12 Months): 75,   Citation Count: 10
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ABSTRACT

A fast parallel thinning algorithm for digital patterns is presented. This algorithm is an improved version of the algorithms introduced by Zhang and Suen [5] and Stefanelli and Rosenfeld [3]. An experiment using an Apple II and an Epson printer was conducted. The results show that the improved algorithm overcomes some of the disadvantages found in [5] by preserving necessary and essential structures for certain patterns which should not be deleted and maintains very fast speed, from about 1.5 to 2.3 times faster than the four-step and two-step methods described in [3] although the resulting skeletons look basically the same.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
1
Fu, KS., and Rosenfeld, A. Pattern recognition and image processing. IEEE Trans. Compuf. C-25,12 (Dec. 1976). 1336-1346.
 
2
Pavlidis, T. A flexible parallel thinning algorithm. In Proceedings of IEEE Computer Society Conference on Pattern Recognition and image Processing. Aug. 1981, 162-167.
3
 
4
Wang, P.S.P.. Ed. Intelligent Sysfems, Imaging Technology and Software Engineering. Sungkang Computer Book Co., Taipei, Taiwan, 1984.
5

CITED BY  10


REVIEW

"Keith Alan Paton : Reviewer"

The authors seek to speed up the algorithm described by Rosenfeld and Kak [1] for the parallel thinning of digital patterns. They achieve a two-fold speed-up at the cost of destroying the algorithm; their version cannot be relied on to preserve   more...

Collaborative Colleagues:
H. E. Lü: colleagues
P. S. P. Wang: colleagues