| Modeling and minimization of interconnect energy dissipation in nanometer technologies |
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Annual ACM IEEE Design Automation Conference
archive
Proceedings of the 38th annual Design Automation Conference
table of contents
Las Vegas, Nevada, United States
Pages: 754 - 757
Year of Publication: 2001
ISBN:1-58113-297-2
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Authors
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Clark N. Taylor
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Department of Electrical and Computer Engineering, University of California, San Diego
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Sujit Dey
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Department of Electrical and Computer Engineering, University of California, San Diego
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Yi Zhao
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Department of Electrical and Computer Engineering, University of California, San Diego
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Downloads (6 Weeks): 2, Downloads (12 Months): 19, Citation Count: 10
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ABSTRACT
As the technology sizes of semiconductor devices continue to decrease, the effect of nanometer technologies on interconnects, such as crosstalk glitches and timing variations, become more significant. In this paper, we study the effect of nanometer technologies on energy dissipation in interconnects. We propose a new power estimation technique which considers DSM effects, resulting in significantly more accurate energy dissipation estimates than transition-count based methods for on-chip interconnects. We also introduce an energy minimization technique which attempts to minimize large voltage swings across the cross-coupling capacitances between interconnects. Even though the number of transitions may increase, our method yields a decrease in power consumption of up to 50%.
REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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CITED BY 10
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Atsushi Sakai , Takashi Yamada , Yoshifumi Matsushita , Hiroto Yasuura, Routing methodology for minimizing 1nterconnect energy dissipation, Proceedings of the 13th ACM Great Lakes symposium on VLSI, April 28-29, 2003, Washington, D. C., USA
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