| Analysis of non-uniform temperature-dependent interconnect performance in high performance ICs |
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Annual ACM IEEE Design Automation Conference
archive
Proceedings of the 38th annual Design Automation Conference
table of contents
Las Vegas, Nevada, United States
Pages: 567 - 572
Year of Publication: 2001
ISBN:1-58113-297-2
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Authors
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Amir H. Ajami
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Dept. of EE-Systems, Univ. of Southern California, Los Angeles, CA
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Kaustav Banerjee
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Center of Integrated Systems, Stanford University, Stanford, CA
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Massoud Pedram
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Dept. of EE-Systems, Univ. of Southern California, Los Angeles, CA
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Lukas P. P. P. van Ginneken
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Magma Design Automation Inc., Cupertino, CA
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Downloads (6 Weeks): 11, Downloads (12 Months): 31, Citation Count: 10
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ABSTRACT
Non-uniform temperature profiles along global interconnect lines in high-performance ICs can significantly impact the performance of these lines. This paper presents a detailed analysis and modeling of the interconnect performance degradation due to non-uniform temperature profiles that exist along their lengths, which in turn arise due to the thermal gradients in the underlying substrate. A non-uniform temperature-dependent distributed RC interconnect delay model is proposed for the first time. The model has been applied to a wide variety of interconnect layouts and temperature distributions to quantify the impact on signal integrity issues including clock skew fluctuations.
REFERENCES
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CITED BY 10
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Kaustav Banerjee , Massoud Pedram , Amir H. Ajami, Analysis and optimization of thermal issues in high-performance VLSI, Proceedings of the 2001 international symposium on Physical design, p.230-237, April 01-04, 2001, Sonoma, California, United States
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