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Analysis of non-uniform temperature-dependent interconnect performance in high performance ICs
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Source Annual ACM IEEE Design Automation Conference archive
Proceedings of the 38th annual Design Automation Conference table of contents
Las Vegas, Nevada, United States
Pages: 567 - 572  
Year of Publication: 2001
ISBN:1-58113-297-2
Authors
Amir H. Ajami  Dept. of EE-Systems, Univ. of Southern California, Los Angeles, CA
Kaustav Banerjee  Center of Integrated Systems, Stanford University, Stanford, CA
Massoud Pedram  Dept. of EE-Systems, Univ. of Southern California, Los Angeles, CA
Lukas P. P. P. van Ginneken  Magma Design Automation Inc., Cupertino, CA
Sponsors
EDAC : Electronic Design Automation Consortium
IEEE-CAS : Circuits & Systems
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
Bibliometrics
Downloads (6 Weeks): 11,   Downloads (12 Months): 32,   Citation Count: 10
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ABSTRACT

Non-uniform temperature profiles along global interconnect lines in high-performance ICs can significantly impact the performance of these lines. This paper presents a detailed analysis and modeling of the interconnect performance degradation due to non-uniform temperature profiles that exist along their lengths, which in turn arise due to the thermal gradients in the underlying substrate. A non-uniform temperature-dependent distributed RC interconnect delay model is proposed for the first time. The model has been applied to a wide variety of interconnect layouts and temperature distributions to quantify the impact on signal integrity issues including clock skew fluctuations.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
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CITED BY  10

Collaborative Colleagues:
Amir H. Ajami: colleagues
Kaustav Banerjee: colleagues
Massoud Pedram: colleagues
Lukas P. P. P. van Ginneken: colleagues