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ABSTRACT
This paper provides an overview of various thermal issues in high-performance VLSI with especial attention to their implications for performance and reliability. More specifically, it examines the impact of thermal effects on both interconnect design and electromigration reliability and discusses their impact on the allowable current density limits. Furthermore, it also discusses how thermal and reliability constrained current density limits may conflict with those obtained through purely performance based criterion. Additionally, it is shown that chip level thermal effects can have a significant impact on large-scale circuit optimization techniques, including the clock-skew minimization scheme, and can influence other physical design problem formulations. Finally, high-current interconnect design rules for ESD and I/O circuits are also examined.
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CITED BY 11
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Bipin Rajendran , Pawan Kapur , Krishna C. Saraswat , R. Fabian , W. Pease, Self-consistent power/performance/reliability analysis for copper interconnects, Proceedings of the 2004 international workshop on System level interconnect prediction, February 14-15, 2004, Paris, France
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Takashi Sato , Junji Ichimiya , Nobuto Ono , Kotaro Hachiya , Masanori Hashimoto, On-chip thermal gradient analysis and temperature flattening for SoC design, Proceedings of the 2005 conference on Asia South Pacific design automation, January 18-21, 2005, Shanghai, China
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Feng Wang , Yuan Xie , N. Vijaykrishnan , M. J. Irwin, On-chip bus thermal analysis and optimization, Proceedings of the conference on Design, automation and test in Europe: Proceedings, March 06-10, 2006, Munich, Germany
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Gian Luca Loi , Banit Agrawal , Navin Srivastava , Sheng-Chih Lin , Timothy Sherwood , Kaustav Banerjee, A thermally-aware performance analysis of vertically integrated (3-D) processor-memory hierarchy, Proceedings of the 43rd annual conference on Design automation, July 24-28, 2006, San Francisco, CA, USA
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