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Interconnect characteristics of 2.5-D system integration scheme
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Source International Symposium on Physical Design archive
Proceedings of the 2001 international symposium on Physical design table of contents
Sonoma, California, United States
Pages: 171 - 175  
Year of Publication: 2001
ISBN:1-58113-347-2
Authors
Yangdong Deng  Department of Electrical and Computer Engineering, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, PA
Wojciech P. Maly  Department of Electrical and Computer Engineering, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, PA
Sponsor
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
Bibliometrics
Downloads (6 Weeks): 7,   Downloads (12 Months): 37,   Citation Count: 13
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ABSTRACT

Growing number of excessively long on-chip wires in modern monolithic ICs is a byproduct of growing chip size. To address this problem instead of placing all systems components in one layer (i.e. in 2-D space) one can use a stack of single layer monolithic ICs (called here a 2.5-D integrated IC). To assess the potential benefits of such a 2.5-D integration schema this paper compares wire length distributions, obtained for 2-D and 2.5-D implementations of benchmark circuits. In the assessment two newly developed floorplanning and placement tools were used. Significant reductions in both total wirelength and worst-case wirelength was observed for the systems implemented as 2.5-D ICs.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
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M. Bohr, "Interconnect Scaling - the Real Limiter to High Performance ULSI," Proceedings of IEDM 1995, pp. 241- 244.
 
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K. W. Lee, T. Nakamura, T. Ono, Y. Yamada, T. Mizukusa, H. Hashmoto, K. T. Park, H. Kurino and M. Koyanagi, "Three-Dimensional Shared Memory Fabricated Using Wafer Stacking Technology," Proceedings of IEDM- 2000, 165-168.
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A. E. Dunlop and B. W. Kernighan, "A Procedure for Placement of Standard Cell VLSI Circuits," IEEE Transactions on Computer-aided Design of Integrated Circuits and System, No.4, Vol.1, 1985, 92-98.
 
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CITED BY  14

Collaborative Colleagues:
Yangdong Deng: colleagues
Wojciech P. Maly: colleagues