| Monte-Carlo algorithms for layout density control |
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Asia and South Pacific Design Automation Conference
archive
Proceedings of the 2000 Asia and South Pacific Design Automation Conference
table of contents
Yokohama, Japan
Pages: 523 - 528
Year of Publication: 2000
ISBN:0-7803-5974-7
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Authors
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Yu Chen
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UCLA Department of Computer Science, Los Angeles, CA
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Andrew B. Kahng
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UCLA Department of Computer Science, Los Angeles, CA
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Gabriel Robins
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Department of Computer Science, University of Virginia, Charlottesville, VA
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Alex Zelikovsky
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Department of Computer Science, Georgia State University, Atlanta, GA
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Downloads (6 Weeks): 4, Downloads (12 Months): 13, Citation Count: 7
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REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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R. R. Divecha, B. E. Stine, D. O. Ouma, J. U. Yoon, D. S. Boning, J. E. Chung, O. S. Nakagawa, and S. Y. Oh, Effect of Fine-line Density and Pitch on Interconnect ILD Thickness Variation in Oxide CMP Process, in Proc. CMP-MIC, Santa Clara, February 1998.
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Andrew B. Kahng , Gabriel Robins , Anish Singh , Huijuan Wang , Alexander Zelikovsky, Filling and slotting: analysis and algorithms, Proceedings of the 1998 international symposium on Physical design, p.95-102, April 06-08, 1998, Monterey, California, United States
[doi> 10.1145/274535.274549]
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A. B. Kahng, G. Robins, A. Singh, and A. Zelikovsky, Filling Algorithms and Analyses for Layout Density Control, IEEE Trans. Computer-Aided Design, 18 (1999), pp. 445-462.
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H. Landis, P. Burke, W. Cote, W. Hill, C. Hoffman, C. Kaanta, C. Koburger, W. Lange, M. Leach, and S. Luce, Integration of Chemical-Mechanical Polishing into CMOS Integrated Circuit Manufacturing, Thin Solid Films, 220 (1992), pp. 1-7.
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G. Nanz and L. E. Camilletti, Modeling of Chemical- Mechanical Polishing: A Review, IEEE Trans. on Semiconductor Manufacturing, 8 (1995), pp. 382-389.
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B. E. Stine, D. S. Boning, J. E. Chung, and L. Camilletti, The Physical and Electrical Effects of Metal-fill Patterning Practices for Oxide Chemical-Mechanical Polishing Processes, IEEE Transactions on Electron Devices, 45 (1998), pp. 665- 679.
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M. Tomozawa, Oxide CMP Mechanisms, Solid State Technology, (1997), pp. 169-175.
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CITED BY 7
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Yu Chen , Andrew B. Kahng , Gabriel Robins , Alexander Zelikovsky, Practical iterated fill synthesis for CMP uniformity, Proceedings of the 37th conference on Design automation, p.671-674, June 05-09, 2000, Los Angeles, California, United States
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Yu Chen , Andrew B. Kahng , Gabriel Robins , Alexander Zelikovsky, Closing the smoothness and uniformity gap in area fill synthesis, Proceedings of the 2002 international symposium on Physical design, April 07-10, 2002, San Diego, CA, USA
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Hua Xiang , Kai-Yuan Chao , Ruchir Puri , Martin D.F. Wong, Is your layout density verification exact?: a fast exact algorithm for density calculation, Proceedings of the 2007 international symposium on Physical design, March 18-21, 2007, Austin, Texas, USA
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Yu Chen , Andrew B. Kahng , Gabriel Robins , Alexander Zelikovsky , Yuhong Zheng, Area Fill Generation With Inherent Data Volume Reduction, Proceedings of the conference on Design, Automation and Test in Europe, p.10868, March 03-07, 2003
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