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ABSTRACT
In this paper CADEP, a problem-oriented language for positioning geometric patterns in a two-dimensional space, is presented.
Although the language has been specifically designed for the automatic generation of integrated circuit masks, it turns out to be well suited also for such other placement problems as architecture design, urban planning, logical and block diagram representation.
The design criteria, the structure, and the specific features of CADEP are illustrated.
REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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