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Layout compaction for yield optimization via critical area minimization
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Source Design, Automation, and Test in Europe archive
Proceedings of the conference on Design, automation and test in Europe table of contents
Paris, France
Pages: 122 - 127  
Year of Publication: 2000
ISBN:1-58113-244-1
Authors
Youcef Bourai  Electrical Engineering Department, University of Washington Box 352500, Seattle, Washington
C.-J. Richard Shi  Electrical Engineering Department, University of Washington Box 352500, Seattle, Washington
Sponsors
EDAA : European Design Automation Association
SIGDA: ACM Special Interest Group on Design Automation
ECSI :
RAS : RAS
EDAC : Electronic Design Automation Consortium
IEEE-CS : Computer Society
IFIP : International Federation for Information Processing
Publisher
ACM  New York, NY, USA
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Downloads (6 Weeks): 3,   Downloads (12 Months): 19,   Citation Count: 6
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REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
1
G. A. Allen et al. "A yield improvement technique for IC layout using local design rules, "IEEE Transactions on Computer Aided Design, vol.11, no. 11, pp.1355-1360, Nov. 1992.
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3
V. K. R. Chiluvuri and I. Koren, Layout-synthesis techniques for yield enhancement , IEEE Transactions on Semiconductors and manufacturing, vol. 8:2 pp. 178-187, May 1995.
 
4
I. Koren and H. C. Stapper, Yield models for defect tolearnt VLSI circuits: A review, in Defect and Fault tolerance on VLSI Systems, vol. 1, I. Koren Ed. New-York: Plenum, pp.1- 21, 1989.
 
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J. K. Ousterhout, Corner stitching: A data-structuring technique for VLSI layout tools, IEEE Transactions on Computer Aided-Design of integrated Circuits and Systems, vol. CAD-3, no.1, pp. 87-100, January 1984.
 
7
S. Sastry and A. Parker, The complexity of two dimensional compaction of VLSI layouts, in Proc. Int. Conf. on Circuits and Computers, pp. 402-406, 1982.
 
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Collaborative Colleagues:
Youcef Bourai: colleagues
C.-J. Richard Shi: colleagues