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Measurement techniques and interconnect estimation
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Source International Workshop on System-Level Interconnect Prediction archive
Proceedings of the 2000 international workshop on System-level interconnect prediction table of contents
San Diego, California, United States
Pages: 79 - 81  
Year of Publication: 2000
ISBN:1-58113-249-2
Author
Dennis Sylvester  Synopsys, Inc., Advanced Technology Group, Mountain View, CA
Sponsor
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
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Downloads (6 Weeks): 3,   Downloads (12 Months): 22,   Citation Count: 1
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REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
1
D. Sylvester, J. C. Chen, B. McGaughy, and C. Hu, "Investigation of interconnect capacitance using charge-based capacitance measurement (CBCM) technique and 3-D simulation," IEEE Journal of Solid-State Circuits, March 1998, pp. 449-453.
 
2
RAPHAEL, version 4.2, Avant! Corporation, 1998.
 
3
T. Sato, D. Sylvester, Y. Cao, and C. Hu, "Accurate in-situ measurement of peak noise and signal delay induced by interconnect coupling," International Solid-State Circuits Conference, pp. 226-227, 2000.
 
4
D. Sylvester, O.S. Nakagawa, and C. Hu, "Modeling the impact of back-end process variation on circuit performance," VLSI Symposium on Technology, Systems, and Applications, pp. 58-61, 1999.