| Minimum supply voltage for bulk Si CMOS GSI |
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International Symposium on Low Power Electronics and Design
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Proceedings of the 1998 international symposium on Low power electronics and design
table of contents
Monterey, California, United States
Pages: 100 - 102
Year of Publication: 1998
ISBN:1-58113-059-7
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Authors
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Azeez J. Bhavnagarwala
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Microelectronic Research Center, Department Electrical Engr., Georgia Institute of Technology, Atlanta, GA
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Blanca Austin
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Microelectronic Research Center, Department Electrical Engr., Georgia Institute of Technology, Atlanta, GA
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James D. Meindl
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Microelectronic Research Center, Department Electrical Engr., Georgia Institute of Technology, Atlanta, GA
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Downloads (6 Weeks): 2, Downloads (12 Months): 7, Citation Count: 1
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ABSTRACT
Limits on energy dissipation are investigated for bulk Si CMOS circuits at each node of the 1997 National Technology Roadmap for Semiconductors (NTRS). Physical, continuous and smooth MOSFET Transregional drain current models that consider high-field effects in scaled devices, and permit trade-offs between saturation drive current and subthreshold leakage current are described and employed to model CMOS circuit performance and power dissipation at low voltages. The Transregional models are used in conjunction with physical threshold voltage roll-off models and stochastic interconnect distributions, at performances, chip sizes and transistor counts forecast by the 1997 NTRS, to project optimal supply and threshold voltages, minimizing total energy dissipated by CMOS logic circuits. Techniques exploiting datapath parallelism to further reduce supply voltage are shown to offer decreasing reductions in power dissipation with technology scaling.
REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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CITED BY
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Azeez J. Bhavnagarwala , Blanca Austin , Ashok Kapoor , James D. Meindl, CMOS system-on-a-chip voltage scaling beyond 50nm, Proceedings of the 10th Great Lakes symposium on VLSI, p.7-12, March 02-04, 2000, Chicago, Illinois, United States
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