ACM Home Page
Please provide us with feedback. Feedback
A pattern matching algorithm for verification and analysis of very large IC layouts
Full text PdfPdf (922 KB)
Source International Symposium on Physical Design archive
Proceedings of the 1998 international symposium on Physical design table of contents
Monterey, California, United States
Pages: 129 - 134  
Year of Publication: 1998
ISBN:1-58113-021-X
Authors
Mariusz Niewczas  Dept. of Electrical and Computer Engineering, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, PA and Dept. of Electronics, Warsaw University of Technology, Warsaw, Poland
Wojciech Maly  Dept. of Electrical and Computer Engineering, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, PA
Andrzej Strojwas  Dept. of Electrical and Computer Engineering, Carnegie Mellon University, 5000 Forbes Ave., Pittsburgh, PA
Sponsors
IEEE-CS : Computer Society
IEEE-CAS : Circuits & Systems
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
Bibliometrics
Downloads (6 Weeks): 6,   Downloads (12 Months): 32,   Citation Count: 2
Additional Information:

abstract   references   cited by   index terms   collaborative colleagues  

Tools and Actions: Request Permissions Request Permissions    Review this Article  
DOI Bookmark: Use this link to bookmark this Article: http://doi.acm.org/10.1145/274535.274554
What is a DOI?

ABSTRACT

We propose a simple, isometry invariant pattern matching algorithm for an effective data reduction useful in layout-related data processing of very complex IC designs. The repeatable geometrical features and attributes are stored in a pattern database. Original pattern instance, or its geometrical attributes, may be quickly regenerated based both on the information stored within the pattern and position of the pattern instance. We also show preliminary results of analysis of the state-of-the-art ICs which suggest that the diversity of patterns does not significantly increase with the increase of chip size.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
1
T. Whitney, "A Hierarchical Design Analysis Front End", in Proc. of F'trst Int. Conf VLSI, Aug. 1981, pp. 217-225
 
2
 
3
D.M.H. Walker, C. Kellen, D. M. Svoboda and A. Strojwas, "The CDB/HCDB Semiconductor Wafer representation Server", IEEE Trans. on CAD, Vol CAD-12, No.2, pp.283- 295, Feb. 1993.
 
4
 
5
N. Hedenstiema and K. O. Jeppson, "The Halo Algorithm - An Algorithm for Hierarchical Design of Rule Checking of VLSI Circuits", IEEE Trans. on CAD, Vol. CAD-12, No. 2. pp 265- 272, Feb. 1993
 
6
Mariusz Niewezas, Xiaolei Li, Andrzej Strojwas and Wojeieeh Maly, "Chip scale 3-D Topography Synthesis", SPIE Optical Microlithography Conference, Feb 1998.
 
7
Neg-Chung Hu, Kuo-Kan Yu, Yung-Li Hsu, "Two-dimensional shape recognition using oriented-polar representation", Optical Engineering, Vol. 36, No. 10, Oct. 1997
 
8
L. Davis, "Shape Matching Using Relaxation Techniques", IEEE Trans. on Pattern Analysis and Machine Intelligence, Vol. PAMI-1, No. 1, Jan. 1979
 
9
T. Pavlidis, "Algorithms for Shape Analysis of Contours and Waveforms", IEEE Trans. on Pattern Analysis and Machine Intelligence, Vol. PAMI-2, No. 4, July 1980
 
10
B. Bhanu and O. Faugeras, "Shape Matching of Two-Dimensional Objects", IEEE Trans. on Pattern Analysis and Machine Intelligence, Vol. PAMI-6, No. 2, March 1984
 
11
S. Z. Li, "Matching: Invariant to Translations, Rotations and Scale Changes", Pattem Recognition, Vo}. 25, No. 6, pp. 583- 594 (1992)
 
12
information about SiCat can be found at http://www.aiss.com
 
13


Collaborative Colleagues:
Mariusz Niewczas: colleagues
Wojciech Maly: colleagues
Andrzej Strojwas: colleagues