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Simulating semiconductor manufacturing systems: successes, failures, and deep questions
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Source Winter Simulation Conference archive
Proceedings of the 28th conference on Winter simulation table of contents
Coronado, California, United States
Pages: 3 - 11  
Year of Publication: 1996
ISBN:0-7803-3383-7
Author
Karl G. Kempf  Manufacturing Systems, Intel Corporation, 5000 W. Chandler Blvd., Chandler, Arizona
Sponsors
INFORMS/CS : Computer Science TC
SIGSIM: ACM Special Interest Group on Simulation and Modeling
IIE : Institute of Industrial Engineers
SCS : Society for Computer Simulation
ASA : American Statistical Association
NIST : National Institue of Standards & Technology
IEEE-CS : Computer Society
IEEE-SMCS : Systems, Man & Cybernetics Society
ACM: Association for Computing Machinery
Publisher
IEEE Computer Society  Washington, DC, USA
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Downloads (6 Weeks): 3,   Downloads (12 Months): 18,   Citation Count: 2
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ABSTRACT

Over the past several years, engineers at Intel Corporation have used modeling and simulation techniques to solve various high volume manufacturing problems. Our current goal is to use a persistent model over the entire life cycle of a factory to promote integration and continuous improvement of all of the components of the manufacturing system. The uses of this model are detailed as well as our progress towards realization of this goal. A summary of problems that we have encountered along the way is included as both a warning to those who have a similar goal and as a work list for vendors of simulation packages. Two disturbing questions about the basis of manufacturing simulation are asked that should be of concern to practicing simulation engineers as well as university researchers.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
1
Beaumariage, T., and K. Kempf. 1994. The Nature and Origin of Chaos in Manufacturing System:;. In Proc. SEMI/IEEE Advanced Semiconductor Manufacturing Conference, 169-174. Institute of Elecla-ical and Electronics Engineers, Piscataway, New Jersey.
 
2
Hilton, C. M., G. Mazenko, L. Solomon, and K. Kempf. 1996. Assembly Floor Layout and Operation. In Proc. Inter. Syrup. on Semiconductor Manufacturing, to appear. Institute of Electrical and Electronics Engineers, Piscataway, New Jersey.
 
3
Sohn, B., A. L. Romero, and S. Mouck. 1996. Designing Fabs for High Performance. In Proc. Inter. Syrup. on Semiconductor Manufacturing, to appear. Institute of Electrical and Electronics Engineers, Piscataway, New Jersey.
 
4
Spier, J., and K. Kempf. 1995. Simulation of Emergent Behavior in Manufacturing Systems. In Proc. SEMI/IEEE Advanced Semiconductor Manufacturing Conference, 90-94. Institute of Eleclrical and Electronics Engineers, Piscataway, New jersey.