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ABSTRACT
A sound IC design methodology must be supported by adequate manufacturability assessment tools. These tools should assist a designer in predicting IC manufacturing cost in as early a design stage as possible. In this paper a yield model is proposed that takes as input a standard cell netlist and produces as output a yield estimate without performing placement and routing. This yield model has been successfully used to predict the interconnect yield of standard cell designs that were implemented with two place and route tools. The proposed yield model can be used as a crucial component in the objective function of a circuit synthesis tool as well as in technology mapping optimization.
REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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W. Maly, "Computer-aided design for VLSI circuit manufacturability," Proc. of the IEEE, vol. 78, no. 25, pp. 356-392, Feb. 1990.
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W. Maly, H.T. Heineken, and F. Agricola, "A Simple New Yield Model," Semiconductor International, pp. 148-154, July 1994.
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H.T. Heineken, J. Khare, and W. Maly, "Yield Loss Forecasting in the Early Phases of the VLSI Design Process," Custom Integrated Circuits Conference, pp. 27-30, May 1996.
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W. Maly and J. Deszczka, "Yield estimation model for VLSI artwork evaluations," Electron. Lett., vol. 19, no. 6, pp. 226-227, March 1983.
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J. Khare, D. Feltham, W. Maly, "Accurate estimation of defect-related yield loss in reconfigurable VLSI circuits," IEEE Journal of Solid-State Circuits, vol.28, no. 2, pp. 146-156, Feb 1993.
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H.T. Heineken and W. Maly, "Standard Cell Interconnect Length Prediction from Structural Circuit Attributes," Custom Integrated Circuits Conference, pp. 167-170, May 1996.
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M. Pedram and B. Preas, "Interconnection length estimation for optimized standard cell layouts," Int. Conference on Computer-Aided Design, pp. 390-393, Nov. 1989.
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CITED BY 9
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Peng Li , Pranab K. Nag , Wojciech Maly, Cost based tradeoff analysis of standard cell designs, Proceedings of the 2000 international workshop on System-level interconnect prediction, p.129-135, April 08-09, 2000, San Diego, California, United States
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W. Maly , H. Heineken , J. Khare , P. K. Nag, Design for manufacturability in submicron domain, Proceedings of the 1996 IEEE/ACM international conference on Computer-aided design, p.690-697, November 10-14, 1996, San Jose, California, United States
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H. T. Heineken , J. Khare , W. Maly , P. K. Nag , C. Ouyang , W. A. Pleskacz, CAD at the design-manufacturing interface, Proceedings of the 34th annual conference on Design automation, p.321-326, June 09-13, 1997, Anaheim, California, United States
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