Complete nanowire crossbar framework optimized for the multi-spacer patterning technique

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Complete nanowire crossbar framework optimized for the multi-spacer patterning technique

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International Conference on Compilers, Architecture and Synthesis for Embedded Systems archive
Proceedings of the 2009 international conference on Compilers, architecture, and synthesis for embedded systems table of contents

Grenoble, France

SESSION: Special session I table of contents

Pages: 11-16

Year of Publication: 2009

ISBN:978-1-60558-626-7

Authors

M. Haykel Ben-Jamaa	EPFL (Swiss Federal Institute of Technology), Lausanne, Switzerland
Gianfranco Cerofolini	University of Milano-Bicocca, Milan, Italy
Yusuf Leblebici	EPFL (Swiss Federal Institute of Technology), Lausanne, Switzerland
Giovanni De Micheli	EPFL (Swiss Federal Institute of Technology), Lausanne, Switzerland

Sponsors

SIGDA: ACM Special Interest Group on Design Automation
ACM: Association for Computing Machinery
SIGBED: ACM Special Interest Group on Embedded Systems
SIGMICRO: ACM Special Interest Group on Microarchitectural Research and Processing

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ACM New York, NY, USA

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ABSTRACT

Nanowire crossbar circuits are an emerging architectural paradigm that promises a higher integration density and an improved fault-tolerance due to its reconfigurability. In this paper, we propose for the first time the utilization of the multi-spacer patterning technique to fabricate nanowire crossbars with a high cross-point density up to 10¹⁰ cm^(-2). We propose a novel decoder fabrication method that can be included in a process dedicated to the multi-spacer patterning technique. We address the technology problems consisting in the variability and fabrication complexity at the design level by optimizing the encoding scheme. We show an overall reduction of the variability by 18% and a cancelation of the fabrication complexity overhead.

REFERENCES

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