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Complete nanowire crossbar framework optimized for the multi-spacer patterning technique
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International Conference on Compilers, Architecture and Synthesis for Embedded Systems archive
Proceedings of the 2009 international conference on Compilers, architecture, and synthesis for embedded systems table of contents
Grenoble, France
SESSION: Special session I table of contents
Pages 11-16  
Year of Publication: 2009
ISBN:978-1-60558-626-7
Authors
M. Haykel Ben-Jamaa  EPFL (Swiss Federal Institute of Technology), Lausanne, Switzerland
Gianfranco Cerofolini  University of Milano-Bicocca, Milan, Italy
Yusuf Leblebici  EPFL (Swiss Federal Institute of Technology), Lausanne, Switzerland
Giovanni De Micheli  EPFL (Swiss Federal Institute of Technology), Lausanne, Switzerland
Sponsors
SIGDA: ACM Special Interest Group on Design Automation
ACM: Association for Computing Machinery
SIGBED: ACM Special Interest Group on Embedded Systems
SIGMICRO: ACM Special Interest Group on Microarchitectural Research and Processing
Publisher
ACM  New York, NY, USA
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ABSTRACT

Nanowire crossbar circuits are an emerging architectural paradigm that promises a higher integration density and an improved fault-tolerance due to its reconfigurability. In this paper, we propose for the first time the utilization of the multi-spacer patterning technique to fabricate nanowire crossbars with a high cross-point density up to 1010 cm(-2). We propose a novel decoder fabrication method that can be included in a process dedicated to the multi-spacer patterning technique. We address the technology problems consisting in the variability and fabrication complexity at the design level by optimizing the encoding scheme. We show an overall reduction of the variability by 18% and a cancelation of the fabrication complexity overhead.


REFERENCES

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