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Resistance extraction using a routing algorithm
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Source Annual ACM IEEE Design Automation Conference archive
Proceedings of the 30th international Design Automation Conference table of contents
Dallas, Texas, United States
Pages: 38 - 42  
Year of Publication: 1993
ISBN:0-89791-577-1
Authors
Sponsors
EDAC : Electronic Design Automation Consortium
IEEE-CAS : Circuits & Systems
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
Bibliometrics
Downloads (6 Weeks): 9,   Downloads (12 Months): 18,   Citation Count: 2
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REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

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R. Brueck and K. Hahn and L. Ladage and E. Migas and B. Reusch and J. Waterkamp: CAMBIO: How to make cell libraries keep pace with technology evolution, FIP WG 10.5 Workshop, Grenoble, 1992, pp. 97-102
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Horowitz, M./Dutton, R.W.: Resistance Extraction from Mask Layout Data, IEEE Transactions on CAD, Vol. CAD-2, No. 3, 1983, pp. 145-150
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Lee, C.Y.: An Algorithm for Path Connections and its Applications, IRE Transactions on electronic Computers, Vol. EC- 10, 1961, pp. 346-365
 
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Mikami, K./Tabuchi, K." A Computer Program for Optimal Routing of Printed Circuit Connectors, IFIPS Proc., Vol. H47, 1968, pp. 1475-1478


Collaborative Colleagues:
Lorenz Ladage: colleagues
Rainer Leupers: colleagues