Circuit design using stripe-shaped PMELA TFTs on glass

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Circuit design using stripe-shaped PMELA TFTs on glass

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Asia and South Pacific Design Automation Conference archive
Proceedings of the 2009 Asia and South Pacific Design Automation Conference table of contents

Yokohama, Japan

SESSION: University LSI design contest table of contents

Pages 105-106

Year of Publication: 2009

ISBN:978-1-4244-2748-2

Authors

Keita Ikai	The University of Tokyo, Tokyo, Japan
Jinmyoung Kim	The University of Tokyo, Tokyo, Japan
Makoto Ikeda	The University of Tokyo, Tokyo, Japan
Kunihiro Asada	The University of Tokyo, Tokyo, Japan

Sponsors

: IEEE Circuits and Systems Society
SIGDA: ACM Special Interest Group on Design Automation
IEICE ESS : Institute of Electronics, Information and Communication Engineers - Engineering Sciences Society
IPSJ SIGSLDM : Information Processing Society of Japan - SIG System LSI Design Methodology

Publisher

IEEE Press Piscataway, NJ, USA

Bibliometrics

Downloads (6 Weeks): 3, Downloads (12 Months): 16, Citation Count: 0

Additional Information:

abstract references collaborative colleagues

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ABSTRACT

A design environment for stripe-shaped PMELA TFTs on glass has been developed and successfully tested. Cell library including standard cells, logic synthesis database, Place and Route rule, layout parasitic extraction rule and transistor models are developed. Measurement results show that the digital circuits designed in this environment work correctly. They also show that the simulation environment is accurate enough for simulating digital circuits.

REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

	1	Buyeol Lee, et al., "A CPU on a glass substrate using CG-Silicon TFTs," ISSCC Dig. of Tech. Papers, pp. 164--165, Feb. 2003.
	2	Masakiyo Matsumura and Chang-Ho Oh, "Advanced excimer-laser annealing process for quasi single-crystal silicon thin-film devices," Thin Solid Films, Vol. 377, issue 1--2, pp. 123--128, Jan. 1999.
	3	M. Jyumonji, et al., "Optimum light intensity distribution for growing large Si grains by phase-modulated excimer-laser annealing," Jpn J. Appl. Phys., Vol. 43, No. 2, pp. 739--744, Feb. 2004.

Collaborative Colleagues:

Keita Ikai: colleagues

Jinmyoung Kim: colleagues

Makoto Ikeda: colleagues

Kunihiro Asada: colleagues

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