| OOPIC simulation of a cylindrical magnetron glow discharge |
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Spring Simulation Multiconference
archive
Proceedings of the 2008 Spring simulation multiconference
table of contents
Ottawa, Canada
SESSION: 2008 Business and industry symposium (BIS'08): Industrial processes
table of contents
Pages 185-189
Year of Publication: 2008
ISBN:1-56555-319-5
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Authors
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M. Johnson
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U.S. Army Armament Research, Development and Engineering Center, Watervliet, NY
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F. Yee
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U.S. Army Armament Research, Development and Engineering Center, Watervliet, NY
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M. Cipollo
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U.S. Army Armament Research, Development and Engineering Center, Watervliet, NY
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K. Truszkowska
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U.S. Army Armament Research, Development and Engineering Center, Watervliet, NY
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J. Verboncoeur
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University of California at Berkeley, Berkeley, CA
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 ABSTRACT
An Object Oriented Particle-in-Cell model of a plasma glow discharge in a cylindrical magnetron cleaning device has been developed to provide guidance in developing a novel in situ surface conditioning technique. The model tracks the trajectories of particles by solving the equations of motion and the electrostatic field equations. Simulation results are compared to experimental measurements obtained from a plasma probe at various axial positions along the substrate surface.
REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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Vigilante, G. and Mulligan, C. 2006. "Cylindrical Magnetron Sputtering (CMS) of Coatings for Wear Life Extension in Large Caliber Cannons", Materials and Manufacturing Processes, Vol. 21, pp. 621--627
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