ACM Home Page
Please provide us with feedback. Feedback
Design and CAD for 3D integrated circuits
Full text PdfPdf (724 KB)
Source Annual ACM IEEE Design Automation Conference archive
Proceedings of the 45th annual Design Automation Conference table of contents
Anaheim, California
SESSION: Special session: 3-D semiconductor integration & packaging table of contents
Pages 668-673  
Year of Publication: 2008
ISBN ~ ISSN:0738-100X , 978-1-60558-115-6
Authors
Paul D. Franzon  NC State University, ECE, Raleigh, NC
W. Rhett Davis  NC State University, ECE, Raleigh, NC
Michael B. Steer  NC State University, ECE, Raleigh, NC
Steve Lipa  NC State University, ECE, Raleigh, NC
Eun Chu Oh  NC State University, ECE, Raleigh, NC
Thor Thorolfsson  NC State University, ECE, Raleigh, NC
Samson Melamed  NC State University, ECE, Raleigh, NC
Sonali Luniya  NC State University, ECE, Raleigh, NC
Tad Doxsee  PTC Inc, Needham, MA
Stephen Berkeley  PTC Inc, Needham, MA
Ben Shani  PTC Inc, Needham, MA
Kurt Obermiller  PTC Inc, Needham, MA
Sponsors
SIGDA: ACM Special Interest Group on Design Automation
: IEEE/CASS/CANDE/CEDA
: The EDA Consortium
Publisher
ACM  New York, NY, USA
Bibliometrics
Downloads (6 Weeks): 26,   Downloads (12 Months): 161,   Citation Count: 0
Additional Information:

abstract   references   index terms   collaborative colleagues  

Tools and Actions: Request Permissions Request Permissions    Review this Article  
DOI Bookmark: Use this link to bookmark this Article: http://doi.acm.org/10.1145/1391469.1391642
What is a DOI?

ABSTRACT

High density Through Silicon Vias (TSV) can be used to build 3DICs that enable unique applications in computing, signal processing and memory intensive systems. This paper presents several case studies that are uniquely enhanced through 3D implementation, including a 3D CAM, an FFT processor, and a SAR processor. The CAD flow used to implement for these designs is described. 3DIC requires higher fidelity thermal modeling than 2DIC design. The rationale for this requirement is established and a possible solution is presented.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
1
W. Davis, J. Wilson, S. Mick, J. Xu, H. Hua, C. Mineo, A. Sule, M. Steer, and P. D. Franzon, "Demystifying 3D ICs: The Pros and Cons of Going Veritical," IEEE Design and Test of Computers, VOl. 222, No. 6, Nov-Dec, 2005, pp. 498--510. Bowman, M., Debray, S. K., and Peterson, L. L. 1993
 
2
E. C. Oh, P. D. Franzon, "Design Considerations and benefits of Three-Dimensional Temary Content Addressable Memory," Proc. IEEE CICC, Oct., 2007.
 
3
H. Hua, "Design and Verification Methodology for Complex Three-Dimensional Digital Integrated Circuits," Ph.D. Dissertation, NC State University, 2006.
 
4
K. Schoenfliess, "Performance Analsysi of System-on-Chip Application of 3D Integrated Circuits," MS. Thesis, NC State University.
 
5
H. P Hofstee, "Future Microprocessors and off-chip SOP Interconnect," in IEEE Trans. Advanced Packaging, Vol. 27, No. 2, May 2004, pp. 301--303.
 
6
P. Li, et al., "IC thermal simulation and modeling via efficient multigrid-based approaches." IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems, 2006, Vol. 25, pp. 1763--1776.
 
7
P. Phelan and R. Niemann, "Effective Thermal Conductivity of a Thin, Randomly Oriented Composite Material." Journal of Heat Transfer, s.l., ASME, 1998, Vol. 120, pp. 971--976.
 
8
J. Wang, et al., "A new approach to modelling the effective thermal conductivity of heterogeneous materials." International Journal of Heat and Mass Transfer, 2006, Vol. 49, pp. 3075--3083.
 
9
 
10
Z. Luo, et al., "High Performance Transistors Featured in an Aggressively Scaled 45nm Bulk CMOS Technology." 2007. pp. 16--17.
 
11
E. Richard, et al., "Manufacturability and Speed Performance Demonstration of Porous ULK (k=2.5) for a 45nm CMOS Platform." 2007. pp. 178--17.

Collaborative Colleagues:
Paul D. Franzon: colleagues
W. Rhett Davis: colleagues
Michael B. Steer: colleagues
Steve Lipa: colleagues
Eun Chu Oh: colleagues
Thor Thorolfsson: colleagues
Samson Melamed: colleagues
Sonali Luniya: colleagues
Tad Doxsee: colleagues
Stephen Berkeley: colleagues
Ben Shani: colleagues
Kurt Obermiller: colleagues