| Statistical analysis of full-chip leakage power considering junction tunneling leakage |
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Annual ACM IEEE Design Automation Conference
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Proceedings of the 44th annual Design Automation Conference
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San Diego, California
SESSION: Leakage power analysis and optimization
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Pages: 99 - 102
Year of Publication: 2007
ISBN ~ ISSN:0738-100X , 978-1-59593-627-1
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Authors
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Tao Li
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Tsinghua University, Beijing, China
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Zhiping Yu
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Tsinghua University, Beijing, China
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Downloads (6 Weeks): 4, Downloads (12 Months): 31, Citation Count: 1
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ABSTRACT
In this paper we address the the growing issue of junction tunneling leakage (Ijunc) at the circuit level. Specifically, we develop a fast approach to analyze the state-dependent total leakage power of a large circuit block, considering Ijunc, sub-threshold leakage (Isub), and gate oxide leakage (Igate). We then propose our algorithm to estimate the full-chip leakage power with consideration of both Gaussian and non-Gaussian parameter distributions, capturing spatial correlations using a grid-based model. Experiments on ISCAS85 benchmarks demonstrate that the estimated results are very accurate and efficient. For a circuit with G gates, the complexity of our approach is O(G).
REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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S. Mukhopadhyay, S. Member, A. Raychowdhury, S. Member, and K. Roy. Accurate estimation of total leakage in nanometer-scale bulk cmos circuits based on device geometry and doping profile. IEEE Trans. CAD, 24(3):363--381, March 2005.
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Dongwoo Lee , Wesley Kwong , David Blaauw , Dennis Sylvester, Analysis and minimization techniques for total leakage considering gate oxide leakage, Proceedings of the 40th conference on Design automation, June 02-06, 2003, Anaheim, CA, USA
[doi> 10.1145/775832.775878]
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Ashish Srivastava , Saumil Shah , Kanak Agarwal , Dennis Sylvester , David Blaauw , Stephen Director, Accurate and efficient gate-level parametric yield estimation considering correlated variations in leakage power and performance, Proceedings of the 42nd annual conference on Design automation, June 13-17, 2005, Anaheim, California, USA
[doi> 10.1145/1065579.1065718]
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A. Papoulis and S. Pillai. Probability, Random Variables and Stochastic Processes. McGraw-Hill, 2001.
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CITED BY
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Tao Li , Wenjun Zhang , Zhiping Yu, Full-chip leakage analysis in nano-scale technologies: mechanisms, variation sources, and verification, Proceedings of the 45th annual conference on Design automation, June 08-13, 2008, Anaheim, California
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