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Robust estimation of parametric yield under limited descriptions of uncertainty
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Source International Conference on Computer Aided Design archive
Proceedings of the 2006 IEEE/ACM international conference on Computer-aided design table of contents
San Jose, California
SESSION: Model order reduction and parametric analysis table of contents
Pages: 884 - 890  
Year of Publication: 2006
ISBN ~ ISSN:1092-3152 , 1-59593-389-1
Authors
Wei-Shen Wang  The University of Texas at Austin
Michael Orshansky  The University of Texas at Austin
Sponsors
IEEE-CS : Computer Society
IEEE-CAS : Circuits & Systems
SIGDA: ACM Special Interest Group on Design Automation
Publisher
ACM  New York, NY, USA
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Downloads (6 Weeks): 8,   Downloads (12 Months): 32,   Citation Count: 3
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ABSTRACT

Reliable prediction of parametric yield for a specific design is difficult; a significant reason is the reliance of the yield estimation methods on the hard-to-measure distributional properties of the process data. Existing methods are inadequate when dealing with real-life distributions of process and environmental parameters, and limited availability of parameter data during early design. This paper proposes a robust technique for full-chip parametric yield estimation; the proposed work is based on the rigorous notions of non-parametric robust statistics which permits estimation based on the knowledge of the range and the limited number of moments (e.g. mean and variance) of the parameter distributions. Fully or partially specified process and environmental parameters can be described by robust representations, and used to estimate probabilistic bounds for leakage dissipation. The proposed approach is applied to estimating the chip-level parametric yield. The experimental results show that the robust estimation algorithm improves the total leakage estimate by 5-13% at the 99th percentile across distinct frequency bins, compared to using only the intervals of partially-specified parameters.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

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Collaborative Colleagues:
Wei-Shen Wang: colleagues
Michael Orshansky: colleagues