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NASFLOW, a simulation tool for silicon technology development
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Source Annual ACM IEEE Design Automation Conference archive
Proceedings of the 27th ACM/IEEE Design Automation Conference table of contents
Orlando, Florida, United States
Pages: 333 - 337  
Year of Publication: 1991
ISBN:0-89791-363-9
Authors
D. David Forsythe  National Semiconductor Corporation, Santa Clara, CA
Atul P. Agarwal  National Semiconductor Corporation, Santa Clara, CA
Chune-Sin Yeh  National Semiconductor Corporation, Santa Clara, CA
Sheldon Aronowitz  National Semiconductor Corporation, Santa Clara, CA
Bhaskar Gadepally  National Semiconductor Corporation, Santa Clara, CA
Sponsors
SIGDA: ACM Special Interest Group on Design Automation
IEEE-CS : Computer Society
Publisher
ACM  New York, NY, USA
Bibliometrics
Downloads (6 Weeks): 6,   Downloads (12 Months): 9,   Citation Count: 0
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ABSTRACT

A simulation system is described for linking two-dimensional simulators for process and device to a parameter extraction program, for the purpose of generating artificial parameters for the circuit analysis program, NASPICE. A key feature of the system is that it operates under the control of a shell program which offers a simple and easy to use interface to the user. Results of an initial development using the program sequence SUPRA = > PISCES = > CADPET = > NASPICE are described. Good correlation was obtained between system generated drain characteristics and silicon for both N and P-channel MOS transistors, and similarly for CMOS DC transfer characteristics.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
1
Andrzej J. Stroiwas, Stephen W. Director, "The Process F.t~gineer's Workbench', IEI'E Journal of Solid- State Circuit,;, Vol. SC-23, No. 2, April |988.
 
2
Steve G. E)uvall, "An Interchange Format for Process and Device Simulation', IEEE Trans. CAD, Vol. CAD-7, No. 7, pp. 741-754, July 1988.
 
3
C.P. Iio, S.E. i lansen, and P.M. Fahey, "SUPREM Ill - A Program for Integrated Circuit Process Modeling and Simulation', Technical Report No. SI!L84-001, Stanford Electronics Laboratories, Stanford University, Stanford, Calif., July 1984.
 
4
D. Olin, M.R. Kump, and R.W. Dutton, "SUPRA: Stanford University Process Analysis Program', Stanford University Laboratories, Stanford University, Stanford, Calif., July 1981.
 
5
M.R. Pinto, C.S. Rafferty, t-|.R. Yeager, and R.W. Dutton, "PISCES I|: Poisson and Continuity Equation Solver', Stanford University Technical Report, Stanford University, Stanford, Calif., Copyright 1984.
 
6
M.R. Pinto, C.S. Rafferty, II.R. Yeager, and R.W. Dutton, "PISCES lib Supplementary Report', Stanford University Technical Report, Stanford University, Stanford, Calif., Copyright 1985.
 
7
S. Selberherr, A. Schutz, I1. Potzl, "MINIMOS - A Two-l)imenslonal Transistor Analyzer", IEEE ED-27, pp. 1 770-1780, (I 980)
 
8
A. Schutz, S. Selberherr, |t. Potzl, "A Numerical Model of the Avalanche Effect in MOS-Transistors", Solid-State Electronics 25, pp. 177-183, (1982)
 
9
W. l lansch, S. Selberherr, "MINIMOS 3: A MOSFET Simulator that Includes Energy Balance", IEEE ED-34, pp. I074-1078, (1987)

Collaborative Colleagues:
D. David Forsythe: colleagues
Atul P. Agarwal: colleagues
Chune-Sin Yeh: colleagues
Sheldon Aronowitz: colleagues
Bhaskar Gadepally: colleagues