Automated generation of monitors for pattern contracts

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Automated generation of monitors for pattern contracts

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Symposium on Applied Computing archive
Proceedings of the 2006 ACM symposium on Applied computing table of contents

Dijon, France

SESSION: Software engineering: sound solutions for the 21^st century table of contents

Pages: 1779 - 1784

Year of Publication: 2006

ISBN:1-59593-108-2

Authors

Benjamin Tyler	Ohio State University, Columbus, OH
Jason O. Hallstrom	Clemson University, Clemson, SC
Neelam Soundarajan	Ohio State University, Columbus, OH

Sponsor

SIGAPP: ACM Special Interest Group on Applied Computing

Publisher

ACM New York, NY, USA

Bibliometrics

Downloads (6 Weeks): n/a, Downloads (12 Months): n/a, Citation Count: 1

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ABSTRACT

While the informal style used to describe design patterns has proven valuable, it is also imprecise. To ensure that patterns are applied correctly, we must also have precise pattern characterizations, and tools for determining whether the appropriate implementation requirements are satisfied. To address this problem, we first present a specification language that captures pattern requirements precisely, as well as the ways in which patterns are specialized for use. Second, we present a tool that generates a set of aspect-oriented monitors for a system based on the specifications of the patterns used in its design. The generated aspects are used to monitor the system at runtime to determine whether the appropriate implementation requirements are satisfied.

REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

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