Concern patterns and analysis

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Concern patterns and analysis

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International Conference on Software Engineering archive
Proceedings of the 2005 workshop on Modeling and analysis of concerns in software table of contents

St. Louis, Missouri

SESSION: Modeling and Analysis of Concerns in Software (MACS) table of contents

Pages: 1 - 5

Year of Publication: 2005

ISBN:1-59593-119-8

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Author

Juri Memmert

JPMDesign

Publisher

ACM New York, NY, USA

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Downloads (6 Weeks): 1, Downloads (12 Months): 12, Citation Count: 0

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ABSTRACT

This paper describes a few concern patterns to identify latent or missing concerns in a concern model and how they impact the development process.

REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

	1	Stanley M. Sutton, Jr. , Isabelle Rouvellou, Modeling of software concerns in Cosmos, Proceedings of the 1st international conference on Aspect-oriented software development, April 22-26, 2002, Enschede, The Netherlands [doi>10.1145/508386.508402]
	2	Concern Manipulation Environment <u>http://www.eclipse.org/cme</u>
	3	Object Mentor <u>http://www.objectmentor.com/publications/dip.pdf</u>.
	4	S. S. Yau, J. S. Collofello, and T. MacGregor, "Ripple Effect Analysis of Software Maintenance," Proc. of the COMPSAC'78, pp.60--65, IEEE Computer Society Press, 1978.
	5	Elisa Baniassad , Siobhan Clarke, Theme: An Approach for Aspect-Oriented Analysis and Design, Proceedings of the 26th International Conference on Software Engineering, p.158-167, May 23-28, 2004