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ABSTRACT
A physical yet compact gate delay model is developed integrating short-channel effects and the Alpha-power law based timing model. This analytical approach accurately predicts both nominal delay and delay variability over a wide range of bias conditions, including sub-threshold. Excellent model scalability enables efficient mapping between process variations and delay variability at the circuit level. Based on this model, relative importance of physical effects on delay variability has been identified. While effective channel length variation is the leading source for variability at current 90nm node, performance variability is actually more sensitive to threshold variation at the sub-threshold region. Furthermore, this model is applied to investigate the limitation of low power design techniques in the presence of process variations, particularly dual Vth and L biasing. Due to excessive variability under low VDD, these techniques become ineffective.
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CITED BY 17
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Sarvesh Bhardwaj , Sarma Vrudhula , Praveen Ghanta , Yu Cao, Modeling of intra-die process variations for accurate analysis and optimization of nano-scale circuits, Proceedings of the 43rd annual conference on Design automation, July 24-28, 2006, San Francisco, CA, USA
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Bonesi Stefano , Davide Bertozzi , Luca Benini , Enrico Macii, Process variation tolerant pipeline design through a placement-aware multiple voltage island design style, Proceedings of the conference on Design, automation and test in Europe, March 10-14, 2008, Munich, Germany
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