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Characterization of MOS transistor current mismatch
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Proceedings of the 17th symposium on Integrated circuits and system design table of contents
Pernambuco, Brazil
SESSION: Analog design table of contents
Pages: 33 - 38  
Year of Publication: 2004
ISBN:1-58113-947-0
Authors
H. Klimach  Universidade Federal de Santa Catarina, Florianopolis - Brazil
A. Arnaud  Universidad de la República, Montevideo - Uruguay
M. C. Schneider  Universidade Federal de Santa Catarina, Florianopolis - Brazil
C. Galup-Montoro  Universidade Federal de Santa Catarina, Florianopolis - Brazil
Sponsor
ACM: Association for Computing Machinery
Publisher
ACM  New York, NY, USA
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ABSTRACT

Electron device matching has been a key factor on the performance of today's analog or even digital electronic circuits. This paper presents a study of drain current matching in MOS transistors. CMOS test structures were designed and fabricated as a way to develop an extensive experimental work, where current mismatch was measured under a wide range of bias conditions. A model for MOS transistor mismatch was also developed, using the carrier number fluctuation theory to account for the effects of local doping fluctuations. This model shows a good fitting with measurements over a wide range of operation conditions, from weak to strong inversion, from linear to saturation region, and allows the assessment of mismatch from process and geometric parameters.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
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Collaborative Colleagues:
H. Klimach: colleagues
A. Arnaud: colleagues
M. C. Schneider: colleagues
C. Galup-Montoro: colleagues