| Hierarchical dummy fill for process uniformity |
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Asia and South Pacific Design Automation Conference
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Proceedings of the 2001 Asia and South Pacific Design Automation Conference
table of contents
Yokohama, Japan
Pages: 139 - 144
Year of Publication: 2001
ISBN:0-7803-6634-4
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Authors
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Yu Chen
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Computer Science Department, UCLA, Los Angeles, CA
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Andrew B. Kahng
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UCSD CSE and ECE Departments, La Jolla, CA
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Gabriel Robins
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Department of Computer Science, University of Virginia, Charlottesville, VA
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Alexander Zelikovsky
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Department of Computer Science, Georgia State University, Atlanta, GA
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Downloads (6 Weeks): 2, Downloads (12 Months): 11, Citation Count: 6
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ABSTRACT
To improve manufacturability and performance predictability, we seek to make a layout uniform with respect to prescribed density criteria, by inserting "fill" geometries into the layout. Previous approaches for at layout density control are not scalable due to the necessity of solving very large linear programs, the large data volume of the solution, and the impact of hierarchy-breaking on verification. In this paper, we give the first methods for hierarchical layout density control for process uniformity. Our approach trades off naturally between runtime, solution quality, and output data volume. We also allow generation of compressed GDSII of fill geometries. Our experiments show that this hybrid hierarchical filling approach saves data volume and is scalable, while yielding solution quality that is competitive with existing Monte-Carlo and linear programming based approaches.
REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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Yu Chen , Andrew B. Kahng , Gabriel Robins , Alexander Zelikovsky, Practical iterated fill synthesis for CMP uniformity, Proceedings of the 37th conference on Design automation, p.671-674, June 05-09, 2000, Los Angeles, California, United States
[doi> 10.1145/337292.337610]
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R. R. Divecha, B. E. Stine, D. O. Ouma, J. U. Yoon, D. S. Boning, et al., "Effect of Fine-line Density and Pitch onInterconnect ILD Thickness Variation in Oxide CMP Process", Proc. CMP-MIC, 1998.
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J. G. Garofalo, J. Q. Zhao, J. Blatchford and E. Nease, "Applications of enhanced optical proximity correction models", Proc. SPIE Optical Microlithography XI, SPIE Vol. 3334, Feb. 1998.
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A. B. Kahng, G. Robins, A. Singh, H. Wang and A. Zelikovsky, "Filling Algorithms and Analyses for Layout Density Control", IEEE Trans. Computer-Aided Design 18(4) (1999), pp. 445- 462.
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H. Landis, P. Burke, W. Cote, W. Hill, C. Hoffman, et al., "Integration of Chemical-Mechanical Polishing into CMOS Integrated Circuit Manufacturing", Thin Solid Films 220(20) (1992), pp. 1-7.
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G. Nanz and L. E. Camilletti, "Modeling of Chemical Mechanical Polishing: A Review", IEEE Trans. on Semiconductor Manufacturing 8(4) (1995), pp. 382-389.
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International Technology Roadmap for Semiconductors, Dec 1999, www.itrs.net/1999 SIA Roadmap/Home.htm
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J. Rey, personal communication, 2000.
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B. Stine, "A Closed-Form Analytical Model for ILD Thickness Variation in CMP Processes", Proc. CMP-MIC, 1997.
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Ruiqi Tian , D. F. Wong , Robert Boone, Model-based dummy feature placement for oxide chemical-mechanical polishing manufacturability, Proceedings of the 37th conference on Design automation, p.667-670, June 05-09, 2000, Los Angeles, California, United States
[doi> 10.1145/337292.337609]
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M. Tomozawa, "Oxide CMP Mechanisms", Solid State Technology 40(7) (1997), pp. 169-175.
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CITED BY 6
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Yu Chen , Andrew B. Kahng , Gabriel Robins , Alexander Zelikovsky, Closing the smoothness and uniformity gap in area fill synthesis, Proceedings of the 2002 international symposium on Physical design, April 07-10, 2002, San Diego, CA, USA
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Hua Xiang , Liang Deng , Ruchir Puri , Kai-Yuan Chao , Martin D.F. Wong, Dummy fill density analysis with coupling constraints, Proceedings of the 2007 international symposium on Physical design, March 18-21, 2007, Austin, Texas, USA
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W. Grobman , M. Thompson , R. Wang , C. Yuan , R. Tian , E. Demircan, Reticle enhancement technology: implications and challenges for physical design, Proceedings of the 38th conference on Design automation, p.73-78, June 2001, Las Vegas, Nevada, United States
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Yu Chen , Andrew B. Kahng , Gabriel Robins , Alexander Zelikovsky , Yuhong Zheng, Area Fill Generation With Inherent Data Volume Reduction, Proceedings of the conference on Design, Automation and Test in Europe, p.10868, March 03-07, 2003
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Hua Xiang , Kai-Yuan Chao , Ruchir Puri , Martin D.F. Wong, Is your layout density verification exact?: a fast exact algorithm for density calculation, Proceedings of the 2007 international symposium on Physical design, March 18-21, 2007, Austin, Texas, USA
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