Numerical Analysis of a Nonlinear Diffusion Problem

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Numerical Analysis of a Nonlinear Diffusion Problem

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Journal of the ACM (JACM) archive
Volume 18 , Issue 3 (July 1971) table of contents

Pages: 373 - 380

Year of Publication: 1971

ISSN:0004-5411

Author

M. S. Mock

IBM Corporation, Components Division, East Fishkill Laboratory, Hopewell Junction, New York

Publisher

ACM New York, NY, USA

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REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

	1	RUNYAN, W. Silicon Semiconductor Technology. McGraw-Hill, New York, 1965, p.. 129.
	2	PLISKIN, W.A. IBM J . R & D 10 (1966), 198 {and references there cited}.
	3	BIRKHOFF, G., AND KELLOGG, B. In Proc. Syrup. on Generalized Networks, Polytechnic Press, Brooklyn, N. Y., 1966, p. 443.
	4	RICHTMYER, R. D., AND MORTON, K.W. Difference Methods for Initial Value Problems, 2nd ed. Wiley, New York, 1967, p. 17.
	5	DOUGLAS, J. J. Soc. Ind. Appl. Math. 8, (1955), 45-11.
	6	SCHWARTZ, J .T . Nonlinear Functional Analysis. Gordon and Breach, New York, 1969, p. 16.
	7	VAROA, R. S. Matrix Iterative Analysis. Prentice-HM1, Englewood Cliffs, N.J., 1962, p. 23.
	8	HENRICI, P. Discrete Variable Methods in Ordinary Differential Equations. Wiley, New York, 1962, p. 366.
	9	HOUSEHOLDER, A.S. Principles of Numerical Analysis. McGraw-Hill, New York, 1965, p. 136.
	10	Hu, S. M. AND SCHMIDT, S. J. Appl. Phys. 39, (1968), 4272.
	11	MASTERS, B. J. AND FAIRFIELD, J. M. Arsenic isoconcentration diffusion studies in silicon. J. Appl. Phys. ~0, (1969), 2390.
	12	KENNEDY, D. P., ET AL. (to be published).