| Interconnect thermal modeling for determining design limits on current density |
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International Symposium on Physical Design
archive
Proceedings of the 1999 international symposium on Physical design
table of contents
Monterey, California, United States
Pages: 172 - 178
Year of Publication: 1999
ISBN:1-58113-089-9
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Authors
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Danqing Chen
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Department of Electrical and Computer Engineering, Coordinated Science Laboratory, University of Illinois at Urbana-Champaign
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Erhong Li
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Department of Electrical and Computer Engineering, Coordinated Science Laboratory, University of Illinois at Urbana-Champaign
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Elyse Rosenbaum
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Department of Electrical and Computer Engineering, Coordinated Science Laboratory, University of Illinois at Urbana-Champaign
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Sung-Mo (Steve) Kang
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Department of Electrical and Computer Engineering, Coordinated Science Laboratory, University of Illinois at Urbana-Champaign
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Downloads (6 Weeks): 1, Downloads (12 Months): 12, Citation Count: 0
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REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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1
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W. R. Hunter, "Self-Consistent Soiutions for Allowed Interconnect Current Density-Part I: Implications for Technology Evolution", IEEE Trans. Electron Devices, vol. 44, No. 2, pp. 304-309, Feb. 1997
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2
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W. R. Hunter, "Self-Consistent Solutions for Allowed Interconnect Current Density-Psrt II: Application to Design Guidelines", IEEE Trans. Electron Devices, vol. 44, No. 2, pp. 310-316, Feb. 1997
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3
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Virgil A. Sandborn, Resistance Temperature Transducers, Metrology Press. Fort Collins, Colorado, pp. 511, 1972
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J. R. Black, "Electromigration Failure Modes in Aluminum Metalization for Semiconductor Devices", in Proc. IEEE, vol. 57, pp. 1587-1594, Sept. 1969
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5
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S. Rzepka, K. B~nerjee, E. Meusel and C. Hu, "Characterization of Self-Heating in Advanced VLSI Interconnect Lines Based on Thermal Finite Element Simulation", IEEE Trans. Components, Packaging, and Manufacturing Technology-part A, vol. 21, No. 3, pp. 406-411, Sept. 1998
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C. C. Teng, Y. K. Cheng, E. Rosenbanm and S. M. Kang, "iTEM: a Temperature Dependent Electromigration Refiability Diagnosis Tool", in IEEE Trans. Computer-Aided Design, vol.16, No.8, pp. 882-893, August 1997
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D. G. Cahill, "Thermal Conductivity Measurement from 30 to 750K: the 3w Method", Rev. Sci. Instrum., vol. 61(2), pp. 802-808, Feb. 1990
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8
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A. J. Chapman, "Heat Transfer", Macmillan Publishing Company, New York, pp. 540, 1983
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S. Kuma~, G. C. Vradis, "Thermal Conductivity of Thin Metallic Films", Transaction of the ASME, vol. 116, pp. 28-34, Feb. 1994
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10
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S. M. Lee, D. G. Cddll, "Heat Transport in Thin Dielectric Films", J. Appl. Phys., 81(6), pp. 2590-2595, M~. 1997
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W.-Y. Shill, J. Levine ~d M. Chang, "Is Interconnect joule Heating a Real Reliability Threat?~, Advanced Metallization and Interconnect Systems for ULSI Applications, pp. 479,-484, 1996
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12
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A. A. Bilotti, "Static Temperature Distribution in IC Chips with Isothermal Heat Source", IEEE Trans. Electron Devices, vol.ED-21, pp. 217-226, Max. 1974
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13
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R. V. Andrews, ~Solving Conductive Heat Transfer Problems with Electrical-Analogue Shape Factor", Chemical Engineering Progress, vol. 51, No. 2, pp. 67- 71, Feb. 1955
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14
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J. H. VanSa~t, "Conduction Heat Transfer Solutions", Lawrence Livermore National Laboratory, Livermore, 1983
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15
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K. E. Goodson and M. I. Flik, "Effect of Microscale Thermal Conduction on the Packing Limit of Siliconon-Insulator Electronic Devices", IEEE Trans. Components, H~brids, Manufacturing Tech.,vol. 15, no. 5, pp. 715-722, Oct. 1992
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