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ABSTRACT
In this paper we develop a gate level model that allows us to determinethe best and worst case delay when there is dominant interconnectcoupling. Assuming that the gate input windows oftransition are known, the model can predict the worst and bestcase noise, as well as the worst and best case impact on delay. Thisis done in terms of a Ceff based gate model under general RCinterconnect loading conditions.
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CITED BY 48
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Ki-Wook Kim , Seong-Ook Jung , Taewhan Kim , Prashant Saxena , C. L. Liu , Sung-Mo Kang, Coupling delay optimization by temporal decorrelation using dual threshold voltage technique, IEEE Transactions on Very Large Scale Integration (VLSI) Systems, v.11 n.5, p.879-887, October 2003
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Noel Menezes , Chandramouli Kashyap , Chirayu Amin, A "true" electrical cell model for timing, noise, and power grid verification, Proceedings of the 45th annual conference on Design automation, June 08-13, 2008, Anaheim, California
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Mattan Kamon , Steve McCormick , Ken Sheperd, Interconnect parasitic extraction in the digital IC design methodology, Proceedings of the 1999 IEEE/ACM international conference on Computer-aided design, p.223-231, November 07-11, 1999, San Jose, California, United States
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