| A new paradigm for low-power, variation-tolerant circuit synthesis using critical path isolation |
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International Conference on Computer Aided Design
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Proceedings of the 2006 IEEE/ACM international conference on Computer-aided design
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San Jose, California
SESSION: Architectural design techniques for high performance and robustness
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Pages: 619 - 624
Year of Publication: 2006
ISBN ~ ISSN:1092-3152 , 1-59593-389-1
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Downloads (6 Weeks): 3, Downloads (12 Months): 47, Citation Count: 3
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ABSTRACT
Design considerations for robustness with respect to variations and low power operations typically impose contradictory design requirements. Low power design techniques such as voltage scaling, dual-Vth etc. can have a large negative impact on parametric yield. In this paper, we propose a novel paradigm for low-power variationtolerant circuit design, which allows aggressive voltage scaling. The principal idea is to (a) isolate and predict the set of possible paths that may become critical under process variations, (b) ensure that they are activated rarely, and (c) avoid possible delay failures in the critical paths by dynamically switching to two-cycle operation (assuming all standard operations are single cycle), when they are activated. This allows us to operate the circuit at reduced supply voltage while achieving the required yield. Simulation results on a set of benchmark circuits at 70nm process technology show average power reduction of 60% with less than 10% performance overhead and 18% overhead in die-area compared to conventional synthesis. Application of the proposed methodology to pipelined design is also investigated.
REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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CITED BY 3
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Bonesi Stefano , Davide Bertozzi , Luca Benini , Enrico Macii, Process variation tolerant pipeline design through a placement-aware multiple voltage island design style, Proceedings of the conference on Design, automation and test in Europe, March 10-14, 2008, Munich, Germany
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