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ABSTRACT
A new general reflectance model for computer graphics is presented. The model is based on physical optics and describes specular, directional diffuse, and uniform diffuse reflection by a surface. The reflected light pattern depends on wavelength, incidence angle, two surface roughness parameters, and surface refractive index. The formulation is self consistent in terms of polarization, surface roughness, masking/shadowing, and energy. The model applies to a wide range of materials and surface finishes and provides a smooth transition from diffuse-like to specular reflection as the wavelength and incidence angle are increased or the surface roughness is decreased. The model is analytic and suitable for Computer Graphics applications. Predicted reflectance distributions compare favorably with experiment. The model is applied to metallic, nonmetallic, and plastic materials, with smooth and rough surfaces.
REFERENCES
Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.
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CITED BY 50
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Xiao D. He , Patrick O. Heynen , Richard L. Phillips , Kenneth E. Torrance , David H. Salesin , Donald P. Greenberg, A fast and accurate light reflection model, ACM SIGGRAPH Computer Graphics, v.26 n.2, p.253-254, July 1992
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Dave Edwards , Solomon Boulos , Jared Johnson , Peter Shirley , Michael Ashikhmin , Michael Stark , Chris Wyman, The halfway vector disk for BRDF modeling, ACM Transactions on Graphics (TOG), v.25 n.1, p.1-18, January 2006
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Donald P. Greenberg , Kenneth E. Torrance , Peter Shirley , James Arvo , Eric Lafortune , James A. Ferwerda , Bruce Walter , Ben Trumbore , Sumanta Pattanaik , Sing-Choong Foo, A framework for realistic image synthesis, Proceedings of the 24th annual conference on Computer graphics and interactive techniques, p.477-494, August 1997
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Hendrik P. A. Lensch , Michael Goesele , Yung-Yu Chuang , Tim Hawkins , Steve Marschner , Wojciech Matusik , Gero Mueller, Realistic materials in computer graphics, ACM SIGGRAPH 2005 Courses, July 31-August 04, 2005, Los Angeles, California
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Hendrik P. A. Lensch , Michael Goesele , Yung-Yu Chuang , Tim Hawkins , Steve Marschner , Wojciech Matusik , Gero Mueller, Realistic materials in computer graphics, ACM SIGGRAPH 2005 Courses, July 31-August 04, 2005, Los Angeles, California
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