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On-chip thermal gradient analysis and temperature flattening for SoC design
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Source Asia and South Pacific Design Automation Conference archive
Proceedings of the 2005 Asia and South Pacific Design Automation Conference table of contents
Shanghai, China
SESSION: Poster session II table of contents
Pages: 1074 - 1077  
Year of Publication: 2005
ISBN:0-7803-8737-6
Authors
Takashi Sato  Renesas Technology
Junji Ichimiya  Ricoh
Nobuto Ono  Jedat Innovation
Kotaro Hachiya  NEC Electronics
Masanori Hashimoto  Osaka Univ.
Sponsors
SIGDA: ACM Special Interest Group on Design Automation
: Shanghai IC Industry Association
: IEEE SSCS Shanghai Chapter
: IEEE CAS
: IEEE Beijing Section
: Fudan University
: Chinese Institute of Electronics
Publisher
ACM  New York, NY, USA
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ABSTRACT

This paper quantitatively analyzes thermal gradient of SoC and proposes a thermal flattening procedure. First, the impact of dominant parameters, such as area occupancy of memory/logic, power density, and floorplan on thermal gradient and clock skew are studied. Important results obtained here are 1) the maximum temperature difference increases with higher memory area occupancy and 2) the difference is very floorplan sensitive. Then, we propose a procedure to amend thermal gradient. A slight floorplan modification using the proposed procedure improves on-chip thermal gradient significantly.


REFERENCES

Note: OCR errors may be found in this Reference List extracted from the full text article. ACM has opted to expose the complete List rather than only correct and linked references.

 
1
J. Clabes et al., "Design and implementation of the POWER5#8482; microprocessor," in Proc. ISSCC, 2004, pp. 56--57.
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3
K. Skadron et al., "Temperature-aware computer systems: Opportunities and challenges," IEEE Micro, vol. 23, no. 6, pp. 52--61, Nov.-Dec. 2003.
 
4
A. H. Ajami, M. Pedram, and K. Banerjee, "Effects of non-uniform substrate temperature on the clock signal integrity in high performance designs," in Proc. CICC, 2001, pp. 233--236.
 
5
J. Black, "Electromigration - a brief survey and some recent results," IEEE Trans. Elec. Dev., vol, ED-16, no. 4, pp. 338--347, April 1969.
6
 
7
Y.-K. Cheng and S.-M. Kang, "Fast thermal analysis for CMOS VLSIC reliability," in Proc. CICC, 1996, pp. 479--482.
 
8
 
9
T.-Y. Wang and C. C.-P. Chen, "3-D thermal-ADI: a linear-time chip level transient thermal simulator," IEEE Trans. on CAD, vol. 21, no. 12, pp. 1434--1445, Dec. 2002.
 
10
 
11
12
 
13
C.-H. Tsai and S.-M. Kang, "Cell-level placement for improving substrate thermal distribution," IEEE Trans. on CAD, vol. 19, no. 2, pp. 253--266, February 2000.
 
14
SIA, International Technology Roadmap for Semiconductors, 2003 Edition.

Collaborative Colleagues:
Takashi Sato: colleagues
Junji Ichimiya: colleagues
Nobuto Ono: colleagues
Kotaro Hachiya: colleagues
Masanori Hashimoto: colleagues